| 标题 |
Elucidating the radiation chemistry of prototypical tin-oxo resist with first-principles computations |
| 网址 | |
| DOI | |
| 其它 |
期刊:Extreme Ultraviolet (EUV) Lithography XII 作者:Jonathan H. Ma; Patrick P. Naulleau; David Prendergast; Andrew Neureuther; Nelson M. Felix; Anna Lio 出版日期:2021 |
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(2025-6-4)