| 标题 |
Photodegradable Polyurethane Resist with High Photosensitivity Based on Hexaarylbiimidazole Molecule Photoswitch |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS applied polymer materials 作者:Shi‐Li Xiang; Peng-Fei Luo; Ying‐Yi Ren; Ling‐Yan Peng; Hong Yin; et al 出版日期:2024-02-27 |
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(2025-6-4)