| 标题 |
The novel TiN film prepared by high-performance metal hardmask PVD system for 28/20 nm technology node |
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| DOI | |
| 其它 |
期刊:2016 China Semiconductor Technology International Conference (CSTIC) 作者:Jianqiang Liu; Junbao Wang; Zhimin Bai; Qiang Li; Zhenguo Ma; et al 出版日期:2016-05-06 |
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(2025-6-4)