| 标题 |
Nonchemically Amplified Resists Enabled by Imide-Modified Poly(styrenesulfonate) Homopolymer with Enhanced Lithography Performance |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS Applied Polymer Materials 作者:Yi-Jie Yang; Cheng-Ji Xu; Yi-Peng Zhang; Jian-Jun He; Fei-Chen Cui; et al 出版日期:2026-09-15 |
| 求助人 | |
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(2025-6-4)