| 标题 |
Understanding the contributions of F–, HF, and HF2– to the etching of SiO2 and unveiling the reaction kinetics to represent etching behavior of SiO2 up to pH 5 |
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| DOI | |
| 其它 |
期刊:Applied Surface Science 作者:Bumsik Kim; Wonje Lee; Sangwoo Lim 出版日期:2024-03-03 |
| 求助人 | |
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(2025-6-4)