| 标题 |
Area-Selective Atomic Layer Deposition of Ru Using Phenyl Silane Inhibitors: Comparison between Amino and Methoxy Head Groups |
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| DOI | |
| 其它 |
期刊:Chemistry of Materials 作者:Jae Hun Hwang; Jee-Eun Choi; E. Cho; Ji-Wo-On Choi; Sojung Yoo; et al 出版日期:2026-03-02 |
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(2025-6-4)