| 标题 |
Relaxation Induced by Imprint Phenomena in Low-Temperature (400 °C) Processed Hf0.5Zr0.5O2-Based Metal-Ferroelectric-Metal Capacitors |
| 网址 | |
| DOI | |
| 其它 |
期刊:ACS Applied Electronic Materials 作者:Jaidah Mohan; Yong Chan Jung; Heber Hernandez-Arriaga; Jin-Hyun Kim; Takashi Onaya; et al 出版日期:2022-02-14 |
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(2025-6-4)