| 标题 |
Voltage waveform tailoring for high aspect ratio plasma etching of SiO2 using Ar/CF4/O2 mixtures: Consequences of ion and electron distributions on etch profiles |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Florian Krüger; Hyunjae Lee; Sang Ki Nam; Mark J. Kushner 出版日期:2022-12-30 |
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(2025-6-4)