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90 积分 2025-09-15 加入
Plasma uniformity and phase-controlled etching in a very high frequency capacitive discharge
11小时前
已完结
Frequency and electrode shape effects on etch rate uniformity in a dual-frequency capacitive reactor
11小时前
已完结
Etching organic low dielectric film in ultrahigh frequency plasma using N2/H2 and N2/NH3 gases
15天前
已完结
Modeling and experimental investigation of the plasma uniformity in CF4/O2 capacitively coupled plasmas, operating in single frequency and dual frequency regime
16天前
已完结
<title>Evaluation of model predictive control in run-to-run processing in semiconductor manufacturing</title>
21天前
已完结
Plasma etching: Yesterday, today, and tomorrow
1个月前
已完结
Effect of sidewall properties on the bottom microtrench during SiO2 etching in a CF4 plasma
1个月前
已完结
A comparative study of CF 4 , Cl 2 and HBr + Ar inductively coupled plasmas for dry etching applications
1个月前
已完结
Nanoscale Buckling of Ultrathin Low-k Dielectric Lines during Hard-Mask Patterning
1个月前
已完结
An extended CFD model to predict the pumping curve in low pressure plasma etch chamber
1个月前
已完结
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