| 标题 |
[高分]
Stress Characterization of the Interface Between Thermal Oxide and the 4H-SiC Epitaxial Layer Using Near-Field Optical Raman Microscopy |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied Spectroscopy 作者:Masanobu Yoshikawa; Yasuhiko Fujita; Masataka Murakami 出版日期:2019 |
| 求助人 | |
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(2025-6-4)