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Low temperature, area-selective atomic layer deposition of NiO and Ni
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其它 | Nickel and nickel oxide are utilized within various device heterostructures for chemical sensing, solar cells, batteries, etc. Recently, the rising interest in realizing low-cost, flexible electronics to enable ubiquitous sensors and solar panels, next-generation displays, and improved human-machine interfaces has driven interest in the development of low-temperature fabrication processes for the integration of inorganic devices with polymeric substrates. Here, we report the low-temperature area-selective atomic layer deposition of Ni by reduction of preformed NiO. Area-selective deposition of NiO is performed at 100 °C using bis(N,N'-di-tert-butylacetamidinato) nickel(II) and water on SiO2 and polystyrene. |
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