| 标题 |
Ionic liquid-mediated morphology and structure of CeO2 nanoparticles for silicon wafers ultra-precision chemical mechanical polishing applications |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of materials research and technology 作者:Siyuan Zhao; Zhenyu Zhang; Na Fan; Qian Hu; Feng Zhao; et al 出版日期:2025-12-11 |
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(2025-6-4)