| 标题 |
Plasma etch selectivity study and material screening for self-aligned gate contact (SAGC) |
| 网址 | |
| DOI |
10.1117/12.2505129
doi
|
| 其它 |
期刊:Advanced Etch Technology for Nanopatterning VIII 作者:Dunja Radisic; Marc Demand; Shihsheng Chang; Steven Demuynck; Kaushik A. Kumar; et al 出版日期:2019-03-21 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
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(2025-6-4)