| 标题 |
An experimental investigation of silicon wafer thinning by sequentially using constant-pressure diamond grinding and fixed-abrasive chemical mechanical polishing |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Materials Processing Technology 作者:Gengzhuo Li; Chen Xiao; Shibo Zhang; Ruoyu Sun; Yongbo Wu 出版日期:2021-11-29 |
| 求助人 | |
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(2025-6-4)