| 标题 |
Investigation of electron transport mechanisms and plasma uniformity control in magnetized rectangular capacitively coupled plasma reactors for advanced plasma etching |
| 网址 | |
| DOI | |
| 其它 |
期刊:Surface and Coatings Technology 作者:Ze-Xuan Liu; Yu-Meng Cui; Quan-Zhi Zhang 出版日期:2026-12-01 |
| 求助人 | |
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(2025-6-4)