| 标题 |
Fundamental Investigation of Chemical Mechanical Polishing of GaAs in Silica Dispersions: Material Removal and Arsenic Trihydride Formation Pathways |
| 网址 | |
| DOI | |
| 其它 |
期刊:ECS Journal of Solid State Science and Technology 作者:J. B. Matovu; P. Ong; L. H. A. Leunissen; Sitaraman Krishnan; S. V. Babu 出版日期:2013-01-01 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)