| 标题 |
High wet-etch resistance SiO2 films deposited by plasma-enhanced atomic layer deposition with 1,1,1-tris(dimethylamino)disilane |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of vacuum science & technology 作者:Su Min Hwang; Harrison Sejoon Kim; Dan N. Le; Akshay Sahota; Jaebeom Lee; et al 出版日期:2022-02-11 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)