| 标题 |
Multiscale modeling of plasma–surface interaction—General picture and a case study of Si and SiO2 etching by fluorocarbon-based plasmas |
| 网址 | |
| DOI | |
| 其它 |
期刊:Applied physics reviews 作者:Patrick Vanraes; Syam Parayil Venugopalan; Annemie Bogaerts 出版日期:2021-10-07 |
| 求助人 | |
| 下载 |
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(2025-6-4)