| 标题 |
Influence of film structure and composition on diffusion barrier performance of SiOx thin films deposited by PECVD |
| 网址 | |
| DOI | |
| 其它 |
期刊:Surface & Coatings Technology 作者:A. Grüniger; A. Bieder; A. Sonnenfeld; P. V. von Rohr; U. Müller; et al 出版日期:2006-04-10 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)