| 标题 |
Quantitative characterization of absorber and phase defects on EUV reticles using coherent diffraction imaging |
| 网址 | |
| DOI |
10.1117/1.JMM.19.1.014002
doi
|
| 其它 |
期刊:Journal of Micro-nanolithography Mems and Moems 作者:Iacopo Mochi; Sara Fernández; Ricarda Nebling; Uldis Locāns; Rajeev Rajendran; et al 出版日期:2020-01-30 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人或该文件上传人下载。 |
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(2025-6-4)