| 标题 |
Measurements of net electron and reaction range in PMMA: an organometallic resists, and a chemically amplified resist for EUV lithography |
| 网址 | |
| DOI |
10.1117/12.3090914
doi
|
| 其它 |
期刊:Advances in Patterning Materials and Processes XLIII 作者:Emma Penny; Stephen Smith; Ilhan Eser; Mani Veeravalli; Robert L. Brainard; et al 出版日期:2026-02-21 |
| 求助人 | |
| 下载 |
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(2025-6-4)