| 标题 |
[高分]
Advances in OPC etch modeling |
| 网址 | |
| DOI |
10.1117/12.2614280
doi
|
| 其它 |
期刊:Advanced Etch Technology and Process Integration for Nanopatterning XI 作者:Germain L. Fenger; Youngchang Kim; Ignat Moskalenko; Johnny Herrera; Alexander Drutsa 出版日期:2022-06-13 |
| 求助人 | |
| 下载 |
PDF的下载单位、IP信息已删除
(2025-6-4)