| 标题 |
Decoupled control of ion transport, energy, and throughput in ultra-low-pressure high-aspect-ratio contact SiO2 etching using C3F6/C4F8 plasmas |
| 网址 | |
| DOI | |
| 其它 |
期刊:Vacuum 作者:Jiachen Wei; Chen Yang; Kyong-Nam Kim; Kwang-Ho Kwon 出版日期:2026-09-01 |
| 求助人 | |
| 下载 |
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(2025-6-4)