| 标题 |
Sensitivity enhancement of a high-resolution negative-tone nonchemically amplified metal organic photoresist for extreme ultraviolet lithography |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of micro/nanopatterning, materials, and metrology 作者:Scott Lewis; Hayden R. Alty; Michaela Vockenhuber; Guy A. DeRose; Antonio Fernández; et al 出版日期:2022-06-02 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)