| 标题 |
Atomistic Modeling Approach for Predicting Association of Photoacid Generators in Extreme Ultraviolet Polymeric Photoresists |
| 网址 | |
| DOI | |
| 其它 |
期刊:Chemistry of Materials 作者:B.P. Prajwal; James M. Blackwell; Patrick L. Theofanis; Fernando A. Escobedo 出版日期:2023-10-31 |
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(2025-6-4)