| 标题 |
Damage-threshold performance of Al2O3 films under high-repetition-rate 266 nm ultraviolet picosecond-laser irradiation |
| 网址 | |
| DOI | |
| 其它 |
期刊:Materials Science in Semiconductor Processing 作者:Menglei Wang; Kun Wang; Qixin Liu; Weili Zhang; Ruchen Zhao; et al 出版日期:2026-02-06 |
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(2025-6-4)