| 标题 |
The discharge characteristics of magnetized capacitively coupled Ar/CH4 plasma with different pressure |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Physics D: Applied Physics 作者:Gui-Qin Yin; Sheng Tuo; Qiang-Hua Yuan; Zilong Sun; Zhan-Hui Gao; et al 出版日期:2026-03-23 |
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(2025-6-4)