| 标题 |
Polytelluoxane as the ideal formulation for EUV photoresist |
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| DOI | |
| 其它 |
期刊:Science Advances 作者:Ruihao Zhou; Muqing Cao; Yizheng Tan; Mark Neisser; Huaping Xu 出版日期:2025-07-16 |
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(2025-6-4)