| 标题 |
Optimization of process parameters to control diameter fluctuation during the monocrystalline silicon growth by hybrid neural network model and genetic algorithm |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Crystal Growth 作者:Jun Xiao; Qitao Zhang; Tai Li; Peilin He; Yuwei Wang; et al 出版日期:2025-09-01 |
| 求助人 | |
| 下载 | 该求助完结已超 24 小时,文件已从服务器自动删除,无法下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)