| 标题 |
Mitigating pattern collapse in high-resolution extreme ultraviolet lithography using the organic dry development rinse process |
| 网址 | |
| DOI |
10.1117/1.jmm.23.3.034603
doi
|
| 其它 |
期刊:Journal of micro/nanopatterning, materials, and metrology 作者:Seonggil Heo; Seungjoo Baek; Mihir Gupta; Hyo Seon Suh; Kodai Kato; et al 出版日期:2024-09-09 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
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(2025-6-4)