| 标题 |
Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phenomena 作者:Huigao Duan; Vitor R. Manfrinato; Joel K. W. Yang; Donald Winston; Bryan M. Cord; Karl K. Berggren 出版日期:2010 |
| 求助人 | |
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(2025-6-4)