| 标题 |
Cavitation-driven nanosecond laser irradiation assisted chemical–mechanical-polishing (CMP) for atomic-scale material removal of 4H-SiC |
| 网址 | |
| DOI | |
| 其它 |
期刊:Optics and Laser Technology 作者:Zirui Wang; Yuguang Zhu; Peng Yang; Tianyu Zhang; Yongguang Wang; et al 出版日期:2025-06-09 |
| 求助人 | |
| 下载 | 求助已完成,仅限求助人下载。 |
PDF的下载单位、IP信息已删除
(2025-6-4)