| 标题 |
Numerical modeling of carrier gas flow in atomic layer deposition vacuum reactor: A comparative study of lattice Boltzmann models |
| 网址 | |
| DOI | |
| 其它 |
期刊:Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 作者:Dongqing Pan; Tao Li; Tien Chien Jen; Chris Yuan 出版日期:2014 |
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(2025-6-4)