电阻随机存取存储器
材料科学
电阻式触摸屏
光电子学
氧化物
随机存取
纳米技术
计算机科学
电气工程
操作系统
电压
工程类
冶金
作者
Ying‐Chen Chen,Chih‐Yang Lin,Chao‐Cheng Lin,Chang-Hsien Lin
标识
DOI:10.1149/2162-8777/adc3c1
摘要
In this study, multi-interfaced oxide-stacked resistive random-access memory (RRAM) with self-rectifying behaviors is presented. Self-rectifying characteristic, or called “nonlinearity,” is essential on the stand-alone RRAM to be implemented in high density crossbar array without integrating the additional selector. To modify the nonlinearity for power efficiency, adding additional material interfaces is considered as an approach to tune the geometric factors in the nanometer-scale microstructure. The trilayer device of HfO x (4 nm)/ SiO x (9 nm)/HfO x (4 nm) layers shows a good memory window (2 × 10 2 ) and nonlinearity (>10) under reduced compliance current limit with balanced bipolar operations as compared to the bilayer device, which provides a better solution for high density nonvolatile memory storage with lower power consumption, and potential new computing applications.
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