Navigating the research landscape for hyper-NA EUV lithography and future patterning technologies
作者
Bruno La Fontaine,Senajith Rekawa,Ryan Miyakawa,Warren Holcomb,Markus P. Benk,Oleg Kostko,Cheng Wang,Qi Zhang,Eric M. Gullikson,Weilun Chao,Mi‐Young Im,Dmytro Zaytsev,Frances A. Houle,Brett A. Helms,Paul F. Nealey,Christopher K. Ober,Ricardo Ruiz