深能级瞬态光谱
材料科学
辐照
空位缺陷
氮化镓
晶体管
镓
宽禁带半导体
电子
质子
原子物理学
电子迁移率
分析化学(期刊)
光电子学
化学
结晶学
硅
纳米技术
电压
物理
冶金
核物理学
量子力学
图层(电子)
色谱法
作者
Pengfei Wan,Weiqi Li,Xiaodong Xu,Yadong Wei,Hao Jiang,Jianqun Yang,Guojian Shao,Gang Lin,Chao Peng,Zhangang Zhang,Xingji Li
摘要
Electron traps in AlGaN/GaN high electron mobility transistors were studied by combining theoretical and experimental methods. Energy levels about EC-0.9 eV due to irradiation are identified by deep-level transient spectroscopy (DLTS). Two electron traps, H1 (EC-0.63 eV) and H2 (EC-0.9 eV), were observed in the DLTS spectra. H1 was produced in device or material manufacturing, and H2 was caused by displacement damage. First, we reported that the signal peak of H2 can contribute from three defects labeled H2-1, H2-2, and H2-3 with energies EC-0.77 eV, EC-0.9 eV, and EC-0.98 eV, respectively. According to defect migration temperature and first principles calculation results, it is found that different configurations of di-nitrogen vacancy structures are the source of EC-0.77 eV and EC-0.9 eV signals. The defect of EC-0.98 eV is more stable at high temperatures, which may be related to gallium vacancy.
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