材料科学
电极
单层
透明度(行为)
图层(电子)
表面粗糙度
光电子学
制作
光伏系统
纳米技术
表面光洁度
复合材料
计算机科学
电气工程
计算机安全
替代医学
化学
物理化学
病理
工程类
医学
作者
Jingyu Zou,Chang‐Zhi Li,Chih‐Yu Chang,Hin‐Lap Yip,Alex K.‐Y. Jen
标识
DOI:10.1002/adma.201306212
摘要
A generally applicable method has been developed for fabricating highly transparent ultrathin Ag films on both glass and plastic substrates using the self-assembled monolayer modified ZnO/Ag/ZnO tri-layer structure. The resulting films show remarkably low surface roughness with very high transparency (>80% between 400 and 600 nm) and low surface resistance (8.61 Ω/□). With an inverted architecture, the devices based on the SAM modified tri-layer UTMF electrode show superior performance and mechanical properties than those using ITO electrode on both glass and plastic substrates. As a service to our authors and readers, this journal provides supporting information supplied by the authors. Such materials are peer reviewed and may be re-organized for online delivery, but are not copy-edited or typeset. Technical support issues arising from supporting information (other than missing files) should be addressed to the authors. Please note: The publisher is not responsible for the content or functionality of any supporting information supplied by the authors. Any queries (other than missing content) should be directed to the corresponding author for the article.
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