浅沟隔离
灵敏度(控制系统)
光电子学
材料科学
百叶窗
光传递函数
CMOS芯片
图像传感器
像素
电压
点间距
光学
沟槽
物理
电气工程
电子工程
工程类
复合材料
图层(电子)
作者
Geunsook Park,Lindsay A. Grant,Alan Chih-Wei Hsuing,Keiji Mabuchi,Jingming Yao,Zhiqiang Lin,V. C. Venezia,Tongtong Yu,Yu-Shen Yang,Tiejun Dai
标识
DOI:10.1109/iedm19573.2019.8993606
摘要
This paper presents a 2.2μm pixel pitch back side illuminated (BSI) Voltage Domain Global Shutter (VDGS) image sensor with Stacked Pixel Level Connection (SPLC) and full backside Deep Trench Isolation (DTI). With these cutting edge technologies, Full Well Capacity (FWC) more than 12,000 electrons and parasitic light sensitivity (PLS) larger than 100 dB are reached. A 38% Quantum Efficiency (QE) and 60% of Modulation Transfer Function (MTF) at 940nm, half Nyquist frequency (Ny/2) is demonstrated.
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