极紫外光刻
光致发光
紫外线
激发态
极端紫外线
材料科学
分析化学(期刊)
物理
光学
激光器
化学
光电子学
原子物理学
色谱法
作者
Jen‐Iu Lo,Yu‐Chain Peng,Hsiao‐Chi Lu,Bing‐Ming Cheng
出处
期刊:Optics Letters
[Optica Publishing Group]
日期:2020-08-31
卷期号:45 (19): 5413-5413
被引量:3
摘要
Upon excitation with extreme ultraviolet (EUV) radiation, optical windows CaF2 and sapphire emit strong photoluminescence (PL) in the ultraviolet region 200-400 nm. The spectral profiles of the windows observed in the PL spectra appear strongly dependent on their temperature. We suggest the use of PL spectra of CaF2 and sapphire excited with EUV light to indicate the temperature for EUV applications such as nano-photolithography technology in manufacturing semiconductor devices; potentially, the method is applicable to a wide range of radiation including the vacuum-ultraviolet (VUV) and EUV regions and in all fields.
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