过电位
覆盖层
电催化剂
氧化物
硫化物
双功能
无机化学
催化作用
材料科学
空位缺陷
析氧
化学
电化学
化学工程
电极
物理化学
冶金
结晶学
工程类
生物化学
作者
Jingxuan Zheng,Dapeng Meng,Junxin Guo,Zhao Wang
标识
DOI:10.1016/j.jallcom.2023.172254
摘要
Transition metal sulfide (TMS) are considered promising alternatives to noble metals for high-efficiency oxygen reduction and oxygen evolution (ORR/OER). However, traditional preparation methods or post-treatment processes can lead to the formation of oxide overlayers on the TMS catalysts, which can hinder their electrochemical performance. Herein, a sulfur-vacancy enriched CuCo2O4/CuCo2S4 heterostructure was prepared using cold plasma. Plasma also achieved the in-situ etching of oxide overlayers on the surface of catalysts. There is a strong correlation between the oxide overlayers and ORR/OER activity. Specifically, the number of ORR electrons transferred increased (n: from 2.8 to 3.7), while the OER overpotential decreased (η: from 417 to 330 mV) in 0.1 M KOH with the decrease of the oxide overlayer concentration (SO42−/SM−S: from 1.795 to 0.798). The theoretical calculation reveals the influence of oxide overlayers and S vacancy on the binding energy of the intermediate. The findings suggest that this work provides a new idea for designing metal sulfide electrochemical catalyst.
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