TiN-NbN-TiN and Permalloy Nanostructures for Applications in Transmission Electron Microscopy

材料科学 坡莫合金 透射电子显微镜 基质(水族馆) 高分辨率透射电子显微镜 光电子学 纳米点 纳米技术 磁化 冶金 磁场 量子力学 海洋学 物理 地质学
作者
M.I. Faley,Joshua J. Williams,Peng‐Han Lu,Rafal E. Dunin–Borkowski
出处
期刊:Electronics [Multidisciplinary Digital Publishing Institute]
卷期号:12 (9): 2144-2144 被引量:2
标识
DOI:10.3390/electronics12092144
摘要

We fabricated superconducting and ferromagnetic nanostructures, which are intended for applications in transmission electron microscopy (TEM), in a commercial sample holder that can be cooled using liquid helium. Nanoscale superconducting quantum-interference devices (nanoSQUIDs) with sub-100 nm nanobridge Josephson junctions (nJJs) were prepared at a distance of ~300 nm from the edges of a 2 mm × 2 mm × 0.05 mm substrate. Thin-film TiN-NbN-TiN heterostructures were used to optimize the superconducting parameters and enhance the oxidation and corrosion resistance of nJJs and nanoSQUIDs. Non-hysteretic I(V) characteristics of nJJs, as well as peak-to-peak quantum oscillations in the V(B) characteristics of the nanoSQUIDs with an amplitude of up to ~20 µV, were obtained at a temperature ~5 K, which is suitable for operation in TEM. Electron-beam lithography, high-selectivity reactive ion etching with pure SF6 gas, and a naturally created undercut in the Si substrate were used to prepare nanoSQUIDs on a SiN membrane within ~500 nm from the edge of the substrate. Permalloy nanodots with diameters down to ~100 nm were prepared on SiN membranes using three nanofabrication methods. High-resolution TEM revealed that permalloy films on a SiN buffer have a polycrystalline structure with an average grain dimension of approximately 5 nm and a lattice constant of ~0.36 nm. The M(H) dependences of the permalloy films were measured and revealed coercive fields of 2 and 10 G at 300 and 5 K, respectively. These technologies are promising for the fabrication of superconducting electronics based on nJJs and ferromagnetic nanostructures for operation in TEM.
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