Harnessing Aggregation‐Induced Emission and Multi‐FRET Strategies in a Single Conjugated Polymer Nanosystem for Enhanced Antibacterial Phototheranostics at Minimal Dosage

光敏剂 共轭体系 荧光 光动力疗法 费斯特共振能量转移 聚合物 光化学 抗菌活性 纳米颗粒 化学 活性氧 材料科学 纳米技术 组合化学 生物物理学 有机化学 细菌 生物化学 物理 量子力学 生物 遗传学
作者
Chunhong Zhu,Sameer Hussain,Ziyu Yue,Kaili Wang,Long Zhang,Mohammad Adil Afroz,Chunqiang Liu,Cibin Zhao,Xinyu Zhang,Ansar Abbas,Jingang An,Hao Yi,Ruixia Gao
出处
期刊:Advanced Healthcare Materials [Wiley]
卷期号:14 (18): e2500794-e2500794 被引量:4
标识
DOI:10.1002/adhm.202500794
摘要

Abstract Developing effective antibacterial photosensitizers with excellent fluorescence properties, enhanced reactive oxygen species (ROS) generation, and low dosage requirements is highly desirable but remains a major challenge. Herein, a new aggregation‐induced emission (AIE)‐active conjugated polymer (FTDM) with remarkable light‐harvesting properties is designed and synthesized by smartly engineering AIE and multi‐FRET processes in its molecular structure. Thanks to donor‐π‐acceptor configuration, involvement of multi‐FRET mechanisms, and the notable AIE effect, the as‐fabricated water dispersible nanoparticles of FTDM (FTDM NPs) demonstrate outstanding fluorescence properties and high ROS generation ability compared to a non‐AIE model conjugated polymer (FDM) and the common photosensitizer Chlorin E6. Efficient fluorescence bioimaging and photodynamic antibacterial activity are achieved using FTDM NPs under white light irradiation (20 mW cm −2 ) for 15 min, demonstrating over 99.99% efficacy against E. coli at a remarkably low dosage of 0.6 µg mL −1 . Furthermore, a mechanically stable hydrogel matrix (FTDM NPs@gel) for use as a wound dressing is attained which demonstrated accelerated wound healing by inhibiting and eliminating bacteria through the photodynamic effect in an infected mouse model without causing any toxicity. Thus, intelligently designed photodynamic antimicrobial nanosystems can be revolutionary in minimizing the toxicity and combating the menace of drug resistance.
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