P‐86: Research on Peeling Performance of Acrylic Photoresist with Isolated Island Pattern for OLED Display

Acrylic photoresists usually act as functional layers inside OLED display because of its low‐temperature curing characteristic, which brings new functions to the OLED display, such as the MLA (micro lens array) technology and the COE (color filter on encapsulation) technology. Inside the OLED display, some acrylic photoresists are required to be made into isolated island pattern (named Island OC), and they are further covered with another layer of acrylic photoresist (named Top OC). The Island OC is easy to peel because its contact area with substrate is very small, and it is probably greatly influenced by the layer of Top OC. This work mainly researched about the influences on the peeling performance of the Island OC by the substrate, Top OC and itself. It's confirmed that the primary cause for peeling of Island OC should be its own insufficient chemical resistance, and improving chemical resistance of Island OC could completely avoid peeling. In addition, the related mechanisms about peeling of Island OC, the residual stresses and the chemical resistance of acrylic photoresist have also been studied.