降级(电信)
基质(水族馆)
电流(流体)
缓冲器(光纤)
材料科学
电压
光电子学
电气工程
计算机科学
电子工程
工程类
地质学
海洋学
作者
Larissa Wehrhahn-Kilian,Paul Salmen,Michael Brambach
标识
DOI:10.23919/ispsd62843.2025.11117479
摘要
In this study, we investigate the critical impact of the substrate quality and epi-buffer design on bipolar degradation in SiC MOSFETs at very high current levels. The test procedure and test results, including a defect analysis, are presented in this paper. Our findings demonstrate that a safe operating area can be defined for each substrate vendor and epi design, up to a specific current density.
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