Multi-field imprint technology: enabling the productivity enhancement of NIL

We have developed Multi-Field Imprint (MFI) technology to improve the productivity of for nano-imprint lithography (NIL). Using the template having the imprinting size of 46 mm x 28 mm for MFI and the latest NIL system NZ2C (Canon Corp.), we successfully achieved multi-field imprinting on a 300 mm wafer. The throughput being equivalent to 160 wafers per hour was demonstrated using throughput enhancement solutions, such as gas permeable spin-on-carbon and multi field dispense. The overlay accuracy around 7 nm was also obtained. In this report, we'll report about the performance of MFI technology: patterning ability, throughput, and overlay accuracy and discuss the future outlook.