Controlling the parameters of focused ion beam for ultra-precise fabrication of nanostructures

At present, the focused ion beam method is an effective technique for nanoscale profiling of a solid surface and prototyping of micro- and nanoscale structures. The article reveals the results of experimental studies on improving the accuracy and resolution of nanoscale profiling of the surface of solids with a focused ion beam. Investigations of the regularities of the influence of the focused ion beam current, beam dwell time and overlap on the parameters of nanoscale structures and the surface profile have been carried out. The influence of the FIB parameters on the deviation of the structure profile from the specified by the template was estimated. Experimental studies have been carried out to determine the influence of the direction of scanning of the ion beam by the template on the magnitude of the error that occurs when the structure of the graphic template is transferred to the substrate. The optimal relationships between the FIB current and the dimensions of the structures being formed have been determined, thus making it possible to ensure the highest accuracy and rate of formation of nanoscale structures. The results can be used to optimize the choice of the ion-beam milling parameters to achieve the maximum accuracy of reproduction of the given sizes of structures.