薄膜晶体管
材料科学
氧化物薄膜晶体管
多晶硅
光电子学
晶体管
阈值电压
非晶硅
硅
晶界
无定形固体
工程物理
锌
电介质
纳米技术
电气工程
电压
冶金
工程类
晶体硅
化学
微观结构
图层(电子)
有机化学
作者
Kavindra Kandpal,Navneet Gupta
出处
期刊:Bulletin of Electrical Engineering and Informatics
[Institute of Advanced Engineering and Science]
日期:2016-06-01
卷期号:5 (2): 205-212
被引量:1
标识
DOI:10.11591/eei.v5i2.530
摘要
This paper presents a review on recent developments and future trends in zinc oxide thin film transistors (ZnO TFTs) together with challenges involved in this technology. It highlights ZnO TFT as next generation choice over other available thin film transistor technology namely a – Si: H (amorphous hydrogenated silicon), poly-Si (polycrystalline silicon) and OTFT (organic thin film transistor). This paper also provides a comparative analysis of various TFTs on the basis of performance parameters. Effect of high –k dielectrics, grain boundaries, trap densities, and threshold voltage shift on the performance of ZnO TFT is also explained.
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