工艺变化
变化(天文学)
晶体管
过程(计算)
计算机科学
节点(物理)
电子工程
电气工程
工程类
物理
电压
操作系统
结构工程
天体物理学
作者
Kelin J. Kuhn,M.D. Giles,D. Becher,Pramod Kolar,A. Kornfeld,R. Kotlyar,Tan Kiat Sean,A. Maheshwari,S. Mudanai
标识
DOI:10.1109/ted.2011.2121913
摘要
Moore's law technology scaling has improved performance by five orders of magnitude in the last four decades. As advanced technologies continue the pursuit of Moore's law, a variety of challenges will need to be overcome. One of these challenges is the management of process variation. This paper discusses the importance of process variation in modern transistor technology, reviews front-end variation sources, presents device and circuit variation measurement techniques, including circuit and memory data from the 32-nm node, and compares recent intrinsic transistor variation performance from the literature.
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