(Invited) Solution Processed Oxide Thin Film Transistors
作者
Christophe Avis,Jin Hyuk Jang
出处
期刊:ECS transactions [Institute of Physics] 日期:2014-08-05卷期号:64 (10): 101-107被引量:6
标识
DOI:10.1149/06410.0101ecst
摘要
The performance of oxide thin-film-transistors (TFTs) by solution process is investigated. From the choice of precursors to the TFTs, each step has its own importance to produce high performance TFTs. The TFT performance is also enhanced by the use of high-k dielectrics such as aluminum oxide (AlOx) instead of silicon dioxide (SiO2). We discuss the performance of both crystalline (SnO2, In2O3) and amorphous (ZTO, IZTO) active materials, manufactured by inkjet-printing. Field-effect mobility of 110cm2/Vs is achieved.