石墨烯
材料科学
薄膜
氧化物
电阻率和电导率
离域电子
化学键
氧气
碳纤维
碳膜
电导率
基面
纳米技术
氧化石墨烯纸
电子结构
化学工程
化学物理
复合材料
结晶学
计算化学
物理化学
有机化学
复合数
化学
工程类
电气工程
冶金
作者
Cecilia Mattevi,Goki Eda,Stefano Agnoli,Steve Miller,K. Andre Mkhoyan,Özgür Çelık,Daniel Mastrogiovanni,Gaetano Granozzi,Eric Garfunkel,Manish Chhowalla
标识
DOI:10.1002/adfm.200900166
摘要
Abstract A detailed description of the electronic properties, chemical state, and structure of uniform single and few‐layered graphene oxide (GO) thin films at different stages of reduction is reported. The residual oxygen content and structure of GO are monitored and these chemical and structural characteristics are correlated to electronic properties of the thin films at various stages of reduction. It is found that the electrical characteristics of reduced GO do not approach those of intrinsic graphene obtained by mechanical cleaving because the material remains significantly oxidized. The residual oxygen forms sp 3 bonds with carbon atoms in the basal plane such that the carbon sp 2 bonding fraction in fully reduced GO is ∼0.80. The minority sp 3 bonds disrupt the transport of carriers delocalized in the sp 2 network, limiting the mobility, and conductivity of reduced GO thin films. Extrapolation of electrical conductivity data as a function of oxygen content reveals that complete removal of oxygen should lead to properties that are comparable to graphene.
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